Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: Towards deposition of multimetallic films
نویسندگان
چکیده
منابع مشابه
Investigations on doping of amorphous and nanocrystalline silicon films deposited by catalytic chemical vapour deposition
Hydrogenated amorphous and nanocrystalline silicon, deposited by catalytic chemical vapour deposition, have been doped during deposition by the addition of diborane and phosphine in the feed gas, with concentrations in the range of 1%. The crystalline fraction, dopant concentration and electrical properties of the films are studied. The nanocrystalline films exhibited a high doping efficiency, ...
متن کاملTwo-Stage Chemical Deposition of Oxide Films
Two-stage chemical deposition (TSCD) technique is used to produce ZnO, Mn2O3 and NiO films on soda-lime glass (SL-G) from an aqueous solution of zinc, manganese and nickel complex, respectively. The TSCD method enables the deposition of metal oxide thin films with a thickness which can be controlled during the preparation procedure. The ZnO, Mn2O3 and NiO thin films were polycrystalline films w...
متن کاملRemote plasma chemical vapour deposition of silicon nitride films
The relatively new technique of remote plasma enhanced
متن کاملChemical vapour deposition of Group Vb metal phosphide thin films
The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl4 and VOCl3 with cyclohexylphosphine at substrate temperatures of 600 C deposits thin films of amorphous vanadium phosphide. The films are black/gold, hard, chemically resistant and conductive. The APCVD reaction of MCl5 (where M = Nb or Ta) with cyclohexylphosphine at 500 C – 600 C deposits films of crystalline -MP ...
متن کاملAtomic layer deposition and properties of ZrO2/Fe2O3 thin films
Thin solid films consisting of ZrO2 and Fe2O3 were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO2 were stabilized by Fe2O3 doping. The number of alternating ZrO2 and Fe2O3 deposition cycles were varied in order to achieve films with different cation ratios. The influence of annealing on the composition and structure of the thin films was investigated. Additionally, ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Alloys and Compounds
سال: 2010
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2010.03.205